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Patent US5527390 Treatment system …

Treatment system including a plurality of treatment apparatus ... US5759214 * 8 Jan 1996: 2 Jun 1998 ... Nitrogen gas supply system: US5788448 * 6 Dec 1995: 4 Aug ...

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Patent US6159332 System for etching …

A system for etching polysilicon in fabricating a semiconductor device is disclosed, which can prevent contamination of a wafer with polymers formed during a ...

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Patent US6120606 Gas vent system for a …

The present invention provides a gas vent system for a vacuum chamber. The particle placed onto the wafer after loading out from a vacuum chamber can be greatly ...

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Patent US6656273 Film forming method …

Nitrogen gas in the gas supply source 158 is supplied from the supply port 157 into the processing station 3, ... US5759214 * 8 Jan 1996: 2 Jun 1998: Nippon Sanso ...

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Patent US6224677 Gas recovery unit …

A CVD device A is provided which is equipped with a gas introduction part A3 having an inert gas supply part G1 for supplying a diluting inert gas and a cleaning gas ...

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Patent US5527390 Treatment system …

Treatment system including a plurality of treatment apparatus ... US5759214 * 8. ... Nitrogen gas supply system: US5788448 * 6. Dez. 1995: 4. Aug. 1998: Tokyo ...

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Patent US5256204 Single semiconductor …

A manufacturing system for processing semiconductor wafers through a plurality of processing stations that perform manufacturing operations on wafers includes a ...

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Brevetto US6224677 Gas recovery unit …

a CVD device including a gas introduction portion, an inert gas supply path in fluid communication with and for supplying a diluting inert gas into said gas ...

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Patent US6120606 Gas vent system for a …

Patentsuche Try the new Google ... Nitrogen can be supplied as the vent gas in the preferred embodiment. ... US5759214 * 8. Jan. 1996: 2. Juni 1998: Nippon Sanso ...

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Patent US5256204 Single semiconductor …

Single semiconductor water transfer method and manufacturing system ... which may be for example clean air or inert gas like nitrogen, ... US5759214 * 8 Sty 1996:

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Patent EP0750340A4 Nitrogen gas supply …

A nitrogen gas supply system for efficiently supplying nitrogen gas in an amount and of purity sufficient and necessary to a wafer processing device (31) for ...

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Patent US5759214 Nitrogen gas supply …

A nitrogen gas supply system which can efficiently supply nitrogen gas to a wafer processing unit 31 for applying a predetermined processing to wafers and to a ...

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